Syllabus Application
Microelectronic Fabrication
EE 407
Faculty:
Faculty of Engineering and Natural Sciences
Semester:
Fall 2025-2026
Course:
Microelectronic Fabrication - EE 407
Classroom:
FENS-L062
Level of course:
Undergraduate
Course Credits:
SU Credit:3.000, ECTS:6, Engineering:6
Prerequisites:
EL 204 or EE 307
Corequisites:
EE 407L
Course Type:
Lecture
Instructor(s) Information
Murat Kaya Yapıcı
- Email: mkyapici@sabanciuniv.edu
Course Information
Catalog Course Description
Semiconductor growth; material characterization; lithography tools; photo-resist models; thin film deposition; chemical etching and plasma etching; electrical contact formation; microstructure processing; and process modeling.
Course Learning Outcomes:
| 1. | In depth understanding of the unit processes involved in IC fabrication, including diffusion, oxidation, ion implantation, lithography, dry/wet etching, physical and chemical vapor deposition techniques. |
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| 2. | To learn the fundamental theory and operation of equipments used in different microelectronic processes. |
| 3. | Identify the performance metrics for each unit process, learn the governing equations to model each process, and how deviations from an ideal process affect device characteristics. |
| 4. | To learn about mask layout, and understand the reasons for layout rules in VLSI design. |
| 5. | Getting hands-on experience in the cleanroom and practicing the unit processes learned in class. |
| 6. | Learn about process modeling tools, device characterization and inspection techniques. |
| 7. | Develop an understanding of modern CMOS fabrication technology, learn about process integration, and be able to develop and understand fabrication flow diagrams. |
Course Objective
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Course Materials
Resources:
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Technology Requirements:
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